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中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics，Chinese Academy of Sciences
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固体润滑国家重点实验... [1]
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稀有金属材料与工程 [1]
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空间润滑材料组 [1]
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姜金龙 [1]
朱维君 [1]
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2014 [1]
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SCI&CSCD [1]
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Indexed By：SCI\&CSCD
Creator：朱维君
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甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文)
期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:
姜金龙
;
陈娣
;
王琼
;
黄浩
;
朱维君
;
郝俊英
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Submit date：2016/02/15
A-c:h Films
Middle-frequency Magnetron Sputtering
Mechanical Property
Tribological Property
A-c:H薄膜
中频磁控溅射
力学性能
摩擦性能
