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甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) 期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:  姜金龙;  陈娣;  王琼;  黄浩;  朱维君;  郝俊英
Adobe PDF(937Kb)  |  Favorite  |  View/Download：117/0  |  Submit date：2016/02/15
A-c:h Films  Middle-frequency Magnetron Sputtering  Mechanical Property  Tribological Property  A-c:H薄膜  中频磁控溅射  力学性能  摩擦性能  
Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 期刊论文
Journal of Nanomaterials, 2014, 页码: 937068-7
Authors:  Jiang JL(姜金龙);  Wang Q(王琼);  Wang YB(王玉宝);  Zhang X(张霞);  Yang H(杨华);  Hao JY(郝俊英);  Jiang JL(姜金龙)
Adobe PDF(2112Kb)  |  Favorite  |  View/Download：230/2  |  Submit date：2014/12/17