Chinese | English

Search in the results

LICP OpenIR

Browse/Search Results:  1-4 of 4 Help

Filters        
Selected(0)Clear Items/Page:    Sort:
Probing superlubricity stability of hydrogenated diamond-like carbon film by varying sliding velocity 期刊论文
Applied Surface Science, Applied Surface Science, Applied Surface Science, 2018, 2018, 2018, 卷号: 439, 439, 439, 页码: 976-982, 976-982, 976-982
Authors:  Liu, Yunhai;  Yu, Bingjun;  Cao ZY(曹忠跃);  Shi, Pengfei;  Zhou, Ningning;  Zhang B(张斌);  Zhang JY(张俊彦);  Qian, Linmao
Adobe PDF(2189Kb)  |  Favorite  |  View/Download：117/2  |  Submit date：2018/06/01
Diamond-like Carbon Film  Superlubricity  Sliding Velocity  Transfer Layer  Diamond-like Carbon Film  Superlubricity  Sliding Velocity  Transfer Layer  Diamond-like Carbon Film  Superlubricity  Sliding Velocity  Transfer Layer  
Hierarchical structure graphitic-like/MoS2 film as superlubricity material 期刊论文
Applied Surface Science, 2017, 卷号: 413, 页码: 381-386
Authors:  Gong ZB(龚珍彬);  Jia, Xiaolong;  Ma, Wei;  Zhang B(张斌);  Zhang JY(张俊彦);  Zhang JY(张俊彦)
Adobe PDF(2769Kb)  |  Favorite  |  View/Download：158/2  |  Submit date：2017/07/10
Hierarchical Structure  Graphitic-like/mos2  Thin Film  Engineering  Superlubricity  
Friction and wear of hydrogenated and hydrogen-free diamond-like carbon films: Relative humidity dependent character 期刊论文
Applied Surface Science, 2017, 卷号: 422, 页码: 147-154
Authors:  Shi J(师晶);  Gong ZB(龚珍彬);  Wang YF(王永富);  Gao KX(高凯雄);  Zhang JY(张俊彦);  Zhang JY(张俊彦)
Adobe PDF(2814Kb)  |  Favorite  |  View/Download：127/2  |  Submit date：2017/11/24
Diamond Like Carbon  Relative Humidity  Friction  Capillary Force  Tribofilm  
Enhanced tribology durability of a self-assembled monolayer of alkylphosphonic acid on a textured copper substrate 期刊论文
Applied Surface Science, 2012, 卷号: 259, 页码: 147-152
Authors:  Wan Y(万勇);  Wang YH(王银虎);  Zhang Q(张全);  Wang ZQ(王忠乾);  Xu Z(许震);  Liu ZS(刘长松);  Zhang JY(张俊彦);  Wan Y(万勇)
Adobe PDF(656Kb)  |  Favorite  |  View/Download：278/3  |  Submit date：2013/07/12
Thin Film  Friction  Self-assembled Monolayer  Chemical Etching  Copper