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Research on the properties of ZnO thin films deposited by using filtered cathodic arc plasma technique on glass substrate under different flow rate of O2 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 4000-4005
Authors:  Li C(李春);  Li XC(李晓春);  Yan PX(阎鹏勋);  Chong EM(崇二敏);  Liu Y(刘洋);  Yue GH(岳光辉);  Fan XY(范晓彦)
Adobe PDF(578Kb)  |  Favorite  |  View/Download：69/1  |  Submit date：2013/11/01
Zno Thin Films  Filtered Cathodic Arc Plasma  Tensile Stress  Electrical Resistivity  Photoluminescence  
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
Adobe PDF(688Kb)  |  Favorite  |  View/Download：152/3  |  Submit date：2013/11/01
Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)