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多晶X射线衍射-光催化联用原位表征分析系统(实用新型) 专利
专利类型: 实用新型, 专利号: 201520156695.2, 申请日期: 2015-07-01, 公开日期: 2015-07-01
Inventors:  何荔;  毕迎普;  杨培菊;  任伟;  焦正波;  牛建中
Adobe PDF(436Kb)  |  Favorite  |  View/Download：341/7  |  Submit date：2015/07/05
Facile fabrication of BiVO4 nanofilms with controlled pore size and their photoelectrochemical performances 期刊论文
Nanoscale, 2015, 卷号: 7, 期号: 48, 页码: 20374-20379
Authors:  Feng CC(冯晨晨);  Jiao ZB(焦正波);  Li SP(李少鹏);  Zhang Y(张彦);  Bi YP(毕迎普);  Bi YP(毕迎普)
Adobe PDF(2517Kb)  |  Favorite  |  View/Download：116/2  |  Submit date：2016/02/26