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The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering 期刊论文
Applied Surface Science, 2008, 卷号: 254, 页码: 5012-5015
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wu ZG(吴志国);  Wang J(王君);  Chen JT(陈江涛)
Adobe PDF(574Kb)  |  Favorite  |  View/Download：79/0  |  Submit date：2013/03/28
Copper Nitride  Thin FIlms  Hydrogen  Structure  Thermal Properties  
The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张君英);  Wang LP(王立平);  Zhang JY(张俊彦)
Adobe PDF(1278Kb)  |  Favorite  |  View/Download：129/2  |  Submit date：2013/03/28
Al-containing Hydrogenated Amorphous Carbon  Magnetron Sputtering  Applied Substrate Pulse Bias  Hardness  Wear Test