Influence of Deposition Temperature on the Structure and Current-Carrying Friction Performance of Cu Films by DC Magnetron Sputtering Technology | |
Department | 固体润滑国家重点实验室(LSL) |
Zhang, Hao1,2; Le, Kai2; Wang, Chen3; Sun, Jianbo1; Xu, Shusheng2,4,5,6; Liu, Weimin2,4 | |
The second department | 合成润滑材料组 |
2022-12-26 | |
Source Publication | Lubricants |
Volume | 11Issue:1Pages:8 |
Abstract | The structure and morphology of Cu films deposited by DC magnetron sputtering on silicon and stainless-steel substrates at different deposition temperatures of −140 °C, −95 °C, −55 °C, 25 °C (RT), 50 °C, and 200 °C were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). It was found that all Cu films presented strong orientation of the (111) and (200) peaks. The Cu films deposited at low temperatures (lower than −55 °C) showed the bilayer structures, in which the upper layer appeared to be a loose and porous structure and the lower layer near the substrate had a fine and dense structure that consisted of small grains. In addition, the Cu films deposited at low temperatures could be observed a large roughness. The roughness tended to decline and then increase with the rising of deposition temperature. The ball-on-disc reciprocating sliding tribometer was employed to evaluate the tribological behaviors of the Cu films at current-carrying levels of 0 A, 0.5 A, and 1.0 A. The results revealed that the Cu films deposited at low temperatures exhibited outstanding current-carrying friction performance and low electrical contact resistance (ECR), peeling only at 0.5 A and 1.0 A. Nevertheless, the Cu films deposited at the relatively high temperature exhibited oxidative wear caused by electric arc ablation at 0.5 A and 1.0 A. Additionally, the wear mechanism was discussed in terms of the structure and morphology of the wear track and formation of the tribo-film. |
Indexed By | SCI |
If | 3.5 |
compositor | 第二作者单位 |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/30613 |
Collection | 固体润滑国家重点实验室(LSL) |
Affiliation | 1.School of Materials Science and Engineering, China University of Petroleum (East China), Qingdao 266580, China 2.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China 3.School of Mechanical & Automotive Engineering, Qingdao University of Technology, Qingdao 266033, China 4.Shandong Laboratory of Yantai Advanced Materials and Green Manufacturing, Yantai 264000, China 5.Yantai Zhongke Research Institute of Advanced Materials and Green Chemical Engineering, Yantai 264000, China 6.Key Laboratory of Solidification Processing, Northwestern Polytechnical University, Xi’an 710072, China |
Recommended Citation GB/T 7714 | Zhang, Hao,Le, Kai,Wang, Chen,et al. Influence of Deposition Temperature on the Structure and Current-Carrying Friction Performance of Cu Films by DC Magnetron Sputtering Technology[J]. Lubricants,2022,11(1):8. |
APA | Zhang, Hao,Le, Kai,Wang, Chen,Sun, Jianbo,Xu, Shusheng,&Liu, Weimin.(2022).Influence of Deposition Temperature on the Structure and Current-Carrying Friction Performance of Cu Films by DC Magnetron Sputtering Technology.Lubricants,11(1),8. |
MLA | Zhang, Hao,et al."Influence of Deposition Temperature on the Structure and Current-Carrying Friction Performance of Cu Films by DC Magnetron Sputtering Technology".Lubricants 11.1(2022):8. |
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lubricants-11-00008.(6749KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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