Facile galvanic replacement deposition of nickel on copper substrate in deep eutectic solvent and its activation ability for electroless Ni–P plating
Department中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Guanqun Hu1,2; Rui Huang3; Hongli Wang4; Qiuping Zhao2; Xingkai Zhang1
The second department纳米润滑组
2022-04-19
Source PublicationJournal of Solid State Electrochemistry
Issue26Pages:1313–1322
If2.747
Language英语
compositor第一作者单位
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/29660
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Corresponding AuthorXingkai Zhang
Affiliation1.Key Laboratory of Science and Technology On Wear and Protection of Materials, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences
2.College of Petrochemical Technology, Lanzhou University of Technology
3.College of Physics and Electronic Engineering, Northwest Normal University
4.State Key Laboratory for Oxo Synthesis and Selective Oxidation, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences
Recommended Citation
GB/T 7714
Guanqun Hu,Rui Huang,Hongli Wang,等. Facile galvanic replacement deposition of nickel on copper substrate in deep eutectic solvent and its activation ability for electroless Ni–P plating[J]. Journal of Solid State Electrochemistry,2022(26):1313–1322.
APA Guanqun Hu,Rui Huang,Hongli Wang,Qiuping Zhao,&Xingkai Zhang.(2022).Facile galvanic replacement deposition of nickel on copper substrate in deep eutectic solvent and its activation ability for electroless Ni–P plating.Journal of Solid State Electrochemistry(26),1313–1322.
MLA Guanqun Hu,et al."Facile galvanic replacement deposition of nickel on copper substrate in deep eutectic solvent and its activation ability for electroless Ni–P plating".Journal of Solid State Electrochemistry .26(2022):1313–1322.
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