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Study on the anti-reflection and structure evolution of hydrogenated amorphous carbon grown by plasma chemical vapor deposition 期刊论文
Surface and interface analysis, 2014, 卷号: 46, 期号: 8, 页码: 530-534
Authors:  Shi J(师晶);  Geng ZR(耿中荣);  Zhang JY(张俊彦);  Wang CB(王成兵);  Zhang JY(张俊彦);  Wang CB(王成兵)
Adobe PDF(793Kb)  |  Favorite  |  View/Download：387/7  |  Submit date：2014/10/17
Hydrogenated Amorphous Carbon  Direct Current Plasma-enhanced Chemical Vapor Deposition  Anti-reflection Property  Raman Spectroscopy  X-ray Photoelectron Spectroscopy