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Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering 期刊论文
Surface and Coatings Technology, 2014, 卷号: 240, 页码: 419-424
Authors:  Jiang JL(姜金龙);  Wang Q(王琼);  Huang H(黄浩);  Wang YB(王玉宝);  Zhang X(张霞);  Hao JY(郝俊英);  Jiang JL(姜金龙)
Adobe PDF(778Kb)  |  Favorite  |  View/Download：193/3  |  Submit date：2014/12/17
A-c:h Films  Mf Magnetron Sputtering  Substrate Rotation  Microstructure And Property