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The effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique 期刊论文
Acta metallurgica sinica, 2005, 卷号: 18, 期号: 3, 页码: 369-374
Authors:  Zhang YJ(张玉娟);  Yan PX(阎鹏勋);  Wu ZG(吴志国);  Zhang WW(张伟伟);  Wang J(王君);  Xue QJ(薛群基)
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Tin  Filtered Cathodic Arc Plasma  Preferred Orientation