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The effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique 期刊论文
Acta metallurgica sinica, 2005, 卷号: 18, 期号: 3, 页码: 369-374
Authors:  Zhang YJ(张玉娟);  Yan PX(阎鹏勋);  Wu ZG(吴志国);  Zhang WW(张伟伟);  Wang J(王君);  Xue QJ(薛群基)
Adobe PDF(737Kb)  |  Favorite  |  View/Download:197/0  |  Submit date:2014/03/03
Tin  Filtered Cathodic Arc Plasma  Preferred Orientation  
磁过滤阴极弧等离子体法氮化钛薄膜的制备及其应用性能的研究 学位论文
: 中国科学院研究生院, 2004
Authors:  张玉娟
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磁过滤阴极弧  等离子体  高质量薄膜  机械性能  电化学腐蚀性能  应用  机理  Tin  Filtered Cathode Arc Plasma  High Quality Thin Films  Mechanical Properties  Electrochemistry Corrosion  Application  Mechanism