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The chemical composition and bonding structure of amorphous hydrogenated carbon nitride film on aluminum surface deposited by electrodeposition 期刊论文
Surface and Interface Analysis, 2011, 卷号: 43, 页码: 823-826
Authors:  Yu YL(于元烈);  Zhang JY(张俊彦)
Adobe PDF(238Kb)  |  Favorite  |  View/Download：229/5  |  Submit date：2012/09/24
Electrodeposition  Characterization  Raman  Xps  Ftir  
The chemical composition and bonding structureofB–C–N–H thin films deposited by reactive magnetron sputtering 期刊论文
Surface and Interface Analysis, 2009, 卷号: 41, 页码: 865-871
Authors:  陈友明;  杨生荣;  张俊彦
Adobe PDF(364Kb)  |  Favorite  |  View/Download：176/0  |  Submit date：2012/11/13
B–c–n–h FIlm  Magnetron Sputtering  Xps  Ftir  Raman  
Fabrication of hydrophobic fluorinated amorphous carbon thin films by an electrochemical route 期刊论文
Electrochemistry Communications, 2008, 卷号: 10, 页码: 7-11
Authors:  Chen G(陈刚);  Zhang JY(张俊彦);  Yang SR(杨生荣)
Adobe PDF(796Kb)  |  Favorite  |  View/Download：188/2  |  Submit date：2013/03/28
Fluorinated Amorphous Carbon  Electrochemical Deposition  Afm  Ftir  Hydrophobic Effect