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The influence of processing gas on the mechanical properties of sputtered B–C–N–H films 期刊论文
Applied Surface Science, 2009, 卷号: 255, 页码: 8575-8581
Authors:  陈友明;  杨生荣;  张俊彦
Adobe PDF(621Kb)  |  Favorite  |  View/Download：198/1  |  Submit date：2012/11/13
Boron Carbon Nitride  Microstructure  Hardness  Residual Stress  Friction Coefficient  
Field emission properties of DLC and phosphorus-doped DLC films prepared by electrochemical deposition process 期刊论文
Applied Surface Science, 2009, 卷号: 255, 页码: 3817-3821
Authors:  Wan SH(万善宏);  Wang LP(王立平);  Zhang JY(张俊彦);  Xue QJ(薛群基)
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Phosphorus-doped Dlc FIlm  Electrochemical Deposition  Field Emission Behavior