| In situ growth of CuS thin films on functionalized self-assembled monolayers using chemical bath deposition | |
| Department | 固体润滑国家重点实验室 |
Luo YJ(罗永娟); Meng X(孟旭); Yi GW(易戈文) ; Jia JH(贾均红)
| |
| 2011 | |
| Source Publication | Journal of Colloid and Interface Science
 |
| ISSN | 0021-9797 |
| Volume | 356Pages:726-733 |
| Abstract | Nano-structured CuS thin films were deposited on the functionalized –NH2-terminated self-assembled monolayers (SAMs) surface by chemical bath deposition (CBD). The deposition mechanism of CuS on the –NH2-terminated group was systematically investigated using field emission scanning electron microscope (FESEM), X-ray photoelectron spectroscope (XPS), UV–vis absorption. The optical, electrical and photoelectrochemical performance of CuS thin films incorporating with the X-ray diffraction (XRD) analysis confirmed the nanocrystalline nature of CuS with hexagonal crystal structure and also revealed that CuS thin film is a p-type semiconductor with high electrical conductivity (12.3 X/h). The functionalized SAMs terminal group plays a key role in the deposition of CuS thin films. The growth of CuS on the varying SAMs surface shows different deposition mechanisms. On –NH2-terminated surfaces, a combination of ion-by-ion growth and cluster-by-cluster deposition can interpret the observed behav- ior. On –OH- and –CH3-terminated surfaces, the dominant growth mechanism on the surface is cluster- by-cluster deposition in the solution. According to this principle, the patterned CuS microarrays with dif- ferent feature sizes were successfully deposited on –NH2-terminated SAMs regions of –NH2/–CH3 pat- terned SAMs surface. |
| Keyword | Copper Sulfide Chemical Bath Deposition Self-assembled Monolayer Selective Deposition |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant Nos. 50705094;50972148);‘‘Hundred Talents Program of Chinese Academy of Sciences’’ (Grant NO.KGCX2-YW-804) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 高温抗磨材料组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/736 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Jia JH(贾均红) |
| Recommended Citation GB/T 7714 | Luo YJ,Meng X,Yi GW,et al. In situ growth of CuS thin films on functionalized self-assembled monolayers using chemical bath deposition[J]. Journal of Colloid and Interface Science,2011,356:726-733. |
| APA | 罗永娟,孟旭,易戈文,&贾均红.(2011).In situ growth of CuS thin films on functionalized self-assembled monolayers using chemical bath deposition.Journal of Colloid and Interface Science,356,726-733. |
| MLA | 罗永娟,et al."In situ growth of CuS thin films on functionalized self-assembled monolayers using chemical bath deposition".Journal of Colloid and Interface Science 356(2011):726-733. |
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