| Deposition of hard elastic hydrogenated fullerenelike carbon films | |
| Department | 固体润滑国家重点实验室 |
Wang Z(王舟); Zhang JY(张俊彦)
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| 2011 | |
| Source Publication | Journal of Applied Physics
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| ISSN | 0021-8979 |
| Volume | 109Pages:103303(1-4) |
| Abstract | Hydrogenated fullerenelike carbon (H-FLC) films, with high hardness of 41.761.4 GPa and elastic recovery of 75.1%, have been uniformly deposited at low temperature by pulse direct current plasma enhanced chemical vapor deposition (pulse DC PECVD). The superior mechanical properties of the H-FLC films are attributed to the unique curvature and interconnection of graphitic basal planes. We propose the fullerenelike structures are formed in the far nonequilibrium pulse plasma environment and stabilized in the sequential fast quenching process. It is expected that the facile deposition of H-FLC films will promote the large-scale low-temperature preparation of engineering protective films for industrial applications. |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant Nos. 50572108;50975273);The Ministry of Science and Technology of China (Grant NO.2010DFA63610) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 纳米润滑研究组 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/733 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Zhang JY(张俊彦) |
| Recommended Citation GB/T 7714 | Wang Z,Zhang JY. Deposition of hard elastic hydrogenated fullerenelike carbon films[J]. Journal of Applied Physics,2011,109:103303(1-4). |
| APA | 王舟,&张俊彦.(2011).Deposition of hard elastic hydrogenated fullerenelike carbon films.Journal of Applied Physics,109,103303(1-4). |
| MLA | 王舟,et al."Deposition of hard elastic hydrogenated fullerenelike carbon films".Journal of Applied Physics 109(2011):103303(1-4). |
| Files in This Item: | ||||||
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| 2011103303.PDF（927KB） | 开放获取 | License | View Application Full Text | |||
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