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在较低底材温度下离子镀氮化钛薄膜的晶体学特性
Department非现建制
丛秋滋; 于德洋; 张平余; 李陇绪
1988
Source Publication真空科学与技术
ISSN1672-7126
Volume8Issue:3Pages:195-200
Abstract本文用X射线衍射方法研究离子镀氮化钛薄膜的晶体学特性。该膜是在起始底材温度(Ts)低于200 ℃以下离子镀在9Cr18不锈钢上。本文揭示在其他离子镀参数一定的条件下, 底材温度Ts愈低, TiN膜愈呈现(220)择优取向, 伴随着晶粒变小、晶格缺陷增大、临界负荷降低等缺点; 而当Ts较高时, TiN膜呈现(200)择优取向, 此时膜的性能优越得多。
Subject Area材料科学与物理化学
Language中文
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/6152
Collection非现建制
Recommended Citation
GB/T 7714
丛秋滋,于德洋,张平余,等. 在较低底材温度下离子镀氮化钛薄膜的晶体学特性[J]. 真空科学与技术,1988,8(3):195-200.
APA 丛秋滋,于德洋,张平余,&李陇绪.(1988).在较低底材温度下离子镀氮化钛薄膜的晶体学特性.真空科学与技术,8(3),195-200.
MLA 丛秋滋,et al."在较低底材温度下离子镀氮化钛薄膜的晶体学特性".真空科学与技术 8.3(1988):195-200.
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