LICP OpenIR  > 清洁能源化学与材料实验室
Effects of a key deep level and interface states on the performance of GaAsN solar cells: a simulation analysis
Department清洁能源化学与材料实验室
Han, Xiuxun1,2; Hwang, Jong-Ha3; Kojima, Nobuaki3; Ohshita, Yoshio3; Yamaguchi, Masafumi3; Han XX(韩修训)
The second department固体润滑国家重点实验室
2012
Source PublicationSemiconductor Science and Technology
ISSN0268-1242
Volume27Issue:10Pages:105013(1-6)
AbstractTo explore the origin of low conversion efficiency of GaAsN solar cells, the effects from a key deep level (E1) at about 0.3–0.4 eV below the conduction band and interface states between the GaAsN emitter and GaAs front surface field layer were investigated by numerical simulation. Our results show that a high deep level concentration in GaAsN layers and a large interface recombination velocity are necessary to fit the experimental data. Interface recombination plays an important role in reducing the quantum efficiency in the short-wavelength region. Its effect can be weakened by applying a thin emitter and a high doping level in the GaAs surface field layer. The abundant existence of E1 is responsible for the high contribution of Shockley–Read–Hall recombination from the space-charged region. Its density should be reduced to <1015 cm−3 for higher conversion efficiency.
Subject Area材料科学与物理化学
DOI10.1088/0268-1242/27/10/105013
Funding Organizationthe ‘Top Hundred Talents Program’ of Chinese Academy of Sciences;the New Energy Development Organization (NEDO)under theministry of Economy, Trade and Industry, Japan
Indexed BySCI
If1.921
Language英语
Funding Project光电材料与器件研究组
compositor第一作者单位
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/4752
Collection清洁能源化学与材料实验室
固体润滑国家重点实验室(LSL)
Corresponding AuthorHan XX(韩修训)
Affiliation1.Chinese Acad Sci, Lanzhou Inst Chem Phys, Lab Clean Energy Chem & Mat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
3.Toyota Technol Inst, Tempaku Ku, Nagoya, Aichi 4688511, Japan
Recommended Citation
GB/T 7714
Han, Xiuxun,Hwang, Jong-Ha,Kojima, Nobuaki,et al. Effects of a key deep level and interface states on the performance of GaAsN solar cells: a simulation analysis[J]. Semiconductor Science and Technology,2012,27(10):105013(1-6).
APA Han, Xiuxun,Hwang, Jong-Ha,Kojima, Nobuaki,Ohshita, Yoshio,Yamaguchi, Masafumi,&韩修训.(2012).Effects of a key deep level and interface states on the performance of GaAsN solar cells: a simulation analysis.Semiconductor Science and Technology,27(10),105013(1-6).
MLA Han, Xiuxun,et al."Effects of a key deep level and interface states on the performance of GaAsN solar cells: a simulation analysis".Semiconductor Science and Technology 27.10(2012):105013(1-6).
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