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偏压对高功率脉冲磁控溅射法沉积MoN涂层结构及性能的影响
Department固体润滑国家重点实验室(LSL)
康建1,2; 隋旭东2,3; 杨淑燕1,2; 周海斌2,3; 郝俊英2,3; 万勇1,2; 刘维民2
The second department润滑与防护薄膜课题组
2023
Source Publication摩擦学学报
Volume43Issue:10Pages:1118-1127
If1.34
Language中文
compositor第二作者单位
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/30475
Collection固体润滑国家重点实验室(LSL)
Corresponding Author隋旭东; 万勇
Affiliation1.青岛理工大学 机械与汽车工程学院, 山东 青岛 266033
2.中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000
3.青岛市资源化学与新材料研究中心, 山东 青岛 266000
Corresponding Author AffilicationLanzhou Institute of Chemical Physics,Chinese Academy of Sciences
Recommended Citation
GB/T 7714
康建,隋旭东,杨淑燕,等. 偏压对高功率脉冲磁控溅射法沉积MoN涂层结构及性能的影响[J]. 摩擦学学报,2023,43(10):1118-1127.
APA 康建.,隋旭东.,杨淑燕.,周海斌.,郝俊英.,...&刘维民.(2023).偏压对高功率脉冲磁控溅射法沉积MoN涂层结构及性能的影响.摩擦学学报,43(10),1118-1127.
MLA 康建,et al."偏压对高功率脉冲磁控溅射法沉积MoN涂层结构及性能的影响".摩擦学学报 43.10(2023):1118-1127.
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