The oxidation behaviors of Cr2N and Cr/Cr2N multilayer coatings on Zircaloy-4 tubes in high temperature environment | |
Department | 固体润滑国家重点实验室(LSL) |
Rongnian Gou1,2; Lunlin Shang2; Liguo Wang2,3; Guangan Zhang2; Zhibin Lu2; Guanghai Bai4; Shunhua Wang1 | |
The second department | 低维润滑材料组 |
2021-09-16 | |
Source Publication | Surface topography metrology and properties |
Volume | 9Issue:3Pages:35045 |
Keyword | Zircaloy-4 tube Cr/Cr2Nmultilayer coating oxidation behavior ATF |
If | 2.038 |
compositor | 第二作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/28006 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Lunlin Shang; Shunhua Wang |
Affiliation | 1.School of Materials Science and Engineering, Lanzhou Jiaotong University 2.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences 3.School of Materials Science and Engineering, Lanzhou University of Technology 4.Life Management Technology Center, Suzhou Nuclear Power Research Institute, China Nuclear Power Technology Research Institute |
Recommended Citation GB/T 7714 | Rongnian Gou,Lunlin Shang,Liguo Wang,et al. The oxidation behaviors of Cr2N and Cr/Cr2N multilayer coatings on Zircaloy-4 tubes in high temperature environment[J]. Surface topography metrology and properties,2021,9(3):35045. |
APA | Rongnian Gou.,Lunlin Shang.,Liguo Wang.,Guangan Zhang.,Zhibin Lu.,...&Shunhua Wang.(2021).The oxidation behaviors of Cr2N and Cr/Cr2N multilayer coatings on Zircaloy-4 tubes in high temperature environment.Surface topography metrology and properties,9(3),35045. |
MLA | Rongnian Gou,et al."The oxidation behaviors of Cr2N and Cr/Cr2N multilayer coatings on Zircaloy-4 tubes in high temperature environment".Surface topography metrology and properties 9.3(2021):35045. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
3.Gou R, Shang L, Wa(2680KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment