Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography
Department中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Zhou B(周波)1,2; Su B(苏博)1; Wurui, Ta3; Zenghui Yang1; Meng JH(孟军虎)1,2
The second department金属陶瓷耐磨材料与先进制造课题组
2021
Source PublicationJournal of Micromechanics and Microengineering
Volume30Issue:2021Pages:075004
Abstract

The soft lithographic fabrication of high-aspect-ratio polydimethylsiloxane (PDMS)
microstructures is quite challenging because of the strong interfacial adhesion between them
and masters during demolding. This paper presents a simple method for fabricating
high-aspect-ratio PDMS microstructures by reducing the interfacial adhesion through the
cooling process. The effect of cooling process on the topography, elastic property, and adhesion
property of Sylgard 184 PDMS is studied. It is found that wrinkles are formed on the surface of
PDMS and that the Young’s modulus of PDMS is increased by the air cooling process.
Consequently, the air-cooled PDMS has lower adhesion than the traditional oven-cooled PDMS.
This result could be explained by the adhesion parameter theory: both the high amplitude of the
wrinkles formed on the surface of PDMS and the high Young’s modulus of PDMS increase
separation forces and reduce adhesive forces in the interface. Application of this method is
demonstrated by fabricating PDMS microchannels from a silicon master which has
microstructures with different aspect ratios. Compared with PDMS microchannels obtained by
the oven cooling process, PDMS microchannels with a depth of 200 µm and an aspect ratio of
10 are successfully fabricated by the air cooling process.
 

MOST Discipline Catalogue工学::材料科学与工程(可授工学、理学学位)
DOIJ. Micromech. Microeng. 31 (2021) 075004 (8pp)
Indexed BySCI
If1.881
Language英语
compositor第一作者单位
Citation statistics
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/27899
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Corresponding AuthorWurui, Ta; Meng JH(孟军虎)
Affiliation1.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics
2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences
3.Key Laboratory of Mechanics on Western Disaster and Environment (Ministry of Education), College of Civil Engineering and Mechanics
Recommended Citation
GB/T 7714
Zhou B,Su B,Wurui, Ta,et al. Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography[J]. Journal of Micromechanics and Microengineering,2021,30(2021):075004.
APA Zhou B,Su B,Wurui, Ta,Zenghui Yang,&Meng JH.(2021).Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography.Journal of Micromechanics and Microengineering,30(2021),075004.
MLA Zhou B,et al."Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography".Journal of Micromechanics and Microengineering 30.2021(2021):075004.
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