Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography | |
Department | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
Zhou B(周波)1,2; Su B(苏博)1; Wurui, Ta3; Zenghui Yang1; Meng JH(孟军虎)1,2 | |
The second department | 金属陶瓷耐磨材料与先进制造课题组 |
2021 | |
Source Publication | Journal of Micromechanics and Microengineering |
Volume | 30Issue:2021Pages:075004 |
Abstract | The soft lithographic fabrication of high-aspect-ratio polydimethylsiloxane (PDMS) |
MOST Discipline Catalogue | 工学::材料科学与工程(可授工学、理学学位) |
DOI | J. Micromech. Microeng. 31 (2021) 075004 (8pp) |
Indexed By | SCI |
If | 1.881 |
Language | 英语 |
compositor | 第一作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/27899 |
Collection | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
Corresponding Author | Wurui, Ta; Meng JH(孟军虎) |
Affiliation | 1.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics 2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences 3.Key Laboratory of Mechanics on Western Disaster and Environment (Ministry of Education), College of Civil Engineering and Mechanics |
Recommended Citation GB/T 7714 | Zhou B,Su B,Wurui, Ta,et al. Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography[J]. Journal of Micromechanics and Microengineering,2021,30(2021):075004. |
APA | Zhou B,Su B,Wurui, Ta,Zenghui Yang,&Meng JH.(2021).Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography.Journal of Micromechanics and Microengineering,30(2021),075004. |
MLA | Zhou B,et al."Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography".Journal of Micromechanics and Microengineering 30.2021(2021):075004. |
Files in This Item: | There are no files associated with this item. |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment