The role of methane in the formation of fullerene-like nanostructure in amorphous carbon film deposited by reactive magnetron sputtering | |
Department | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
Pei LL(裴露露)1,2; Ju PF(鞠鹏飞)3; Ji L(吉利)1; Li HX(李红轩)1; Liu XH(刘晓红)1; Xue DS(薛德胜)4; Zhou HD(周惠娣)1; Chen JM(陈建敏)1 | |
The second department | 磨损与表面工程组 |
2020 | |
Source Publication | Diamond & Related Materials |
Issue | 109Pages:108018 |
Abstract | The formation of fullerene-like nanostructure in amorphous carbon film is an efficient way to improve the toughness without reducing the hardness of hydrogenated amorphous carbon film. In this paper, a convenient approach to regulating the growth of fullerene-like nanostructure by reactive magnetron sputtering process utilizing graphite target in mixed methane and argon plasma was reported and the role of methane in the formation of fullerene-like nanostructure in amorphous carbon film was discussed. By adjusting the degree of graphite target poisoning, fullerene-like nanostructure was successfully produced in the carbon film. In order to reveal the growth mechanism of this special structure, the structural evolution of the film and graphite target surface were studied. The results suggest that the structure of the target surface and the film are both amorphous carbon when target poisoning severely, and the fullerene-like nanostructure appears in carbon film when target poisoning slightly. However, when methane was not admitted into the chamber, the target was not poisoned, non‑hydrogenated carbon film was prepared. The structure of non‑hydrogenated carbon film is graphite-like. Therefore, that shows the important effect of target poisoning on the structure of film and methane plays an important role in the formation of fullerene-like nanostructure in amorphous carbon film. The formation of the fullerene-like nanostructure is attributed to the deposition of ionized methane on the target surface, which is introduced sp3-hybridized carbon atoms into the graphite structure, resulting in the curvature of the graphite 2D-plane. Nonetheless, when a large amount of methane plasma deposits on the target surface will cause target poisoning severely, the structure of the target surface and the film are both amorphous carbon. |
Keyword | Methane Target poisoning Fullerene-like nanostructure Hydrogenated carbon films Reactive magnetron sputtering |
MOST Discipline Catalogue | 工学::材料科学与工程(可授工学、理学学位) |
DOI | https://doi.org/10.1016/j.diamond.2020.108018 |
Indexed By | SCI |
If | 2.65 |
Language | 英语 |
compositor | 第一作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/26921 |
Collection | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
Corresponding Author | Ji L(吉利); Li HX(李红轩) |
Affiliation | 1.Key Laboratory of Science and Technology on Wear and Protection of Materials, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China 2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China 3.Shanghai Aerospace Equipment Manufacture, Shanghai 200245, China 4.School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China |
Recommended Citation GB/T 7714 | Pei LL,Ju PF,Ji L,et al. The role of methane in the formation of fullerene-like nanostructure in amorphous carbon film deposited by reactive magnetron sputtering[J]. Diamond & Related Materials,2020(109):108018. |
APA | Pei LL.,Ju PF.,Ji L.,Li HX.,Liu XH.,...&Chen JM.(2020).The role of methane in the formation of fullerene-like nanostructure in amorphous carbon film deposited by reactive magnetron sputtering.Diamond & Related Materials(109),108018. |
MLA | Pei LL,et al."The role of methane in the formation of fullerene-like nanostructure in amorphous carbon film deposited by reactive magnetron sputtering".Diamond & Related Materials .109(2020):108018. |
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