| Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting | |
| Department | ERC国家工程研究中心 |
贾玉龙#; 汪忠浩#; Ma Y(马英) ; Jiali Liu; Wenbing Shi; Yinhe Lin; Hu X(胡勋); Zhang K(张侃)
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| The second department | 生物质能源转化 |
| 2019 | |
| Source Publication | Electrochimica Acta
 |
| Volume | 300Issue:0Pages:138e144 |
| If | 5.116 |
| compositor | 第二作者单位 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/24929 |
| Collection | 精细石油化工中间体国家工程研究中心（ERC） |
| Corresponding Author | Ma Y(马英); Zhang K(张侃) |
| Affiliation | 1.School of Chemistry and Chemical Engineering, Yangtze Normal University, Chongqing, 408000, China 2.National Engineering Research Center for Fine Petrochemical Intermediates, State Key Laboratory for Oxo Synthesis and Selective Oxidation, Lanzhou, China 3.School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, China |
| Recommended Citation GB/T 7714 | 贾玉龙#,汪忠浩#,Ma Y,et al. Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting[J]. Electrochimica Acta,2019,300(0):138e144. |
| APA | 贾玉龙#.,汪忠浩#.,Ma Y.,Jiali Liu.,Wenbing Shi.,...&Zhang K.(2019).Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting.Electrochimica Acta,300(0),138e144. |
| MLA | 贾玉龙#,et al."Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting".Electrochimica Acta 300.0(2019):138e144. |
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