A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films
Department先进润滑与防护材料研究发展中心
Xu SS(徐书生); Hu M(胡明); Sun JY(孙嘉奕); Weng LJ(翁立军); Liu WM(刘维民); Gao XM(高晓明); Gao XM(高晓明)
The second department固体润滑国家重点实验室
2018
Source PublicationMaterials Letters
ISSN0167-577X
Volume216Issue:0Pages:179-181
Abstract

Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties.

KeywordPhysical Vapour Deposition Thin Films Structural
Subject Area材料科学与物理化学
DOI10.1016/j.matlet.2018.01.027
Funding OrganizationChina National Natural Science Foundation (Grant Nos. 51575508 ; 51505465)
Indexed BySCI
If2.687
Language英语
Funding ProjectPVD润滑薄膜研究组 ; 空间润滑材料研究组
compositor第一作者单位
Citation statistics
Cited Times:10[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/22854
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
固体润滑国家重点实验室(LSL)
Corresponding AuthorGao XM(高晓明)
AffiliationState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, PR China
Recommended Citation
GB/T 7714
Xu SS,Hu M,Sun JY,et al. A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films[J]. Materials Letters,2018,216(0):179-181.
APA Xu SS.,Hu M.,Sun JY.,Weng LJ.,Liu WM.,...&Gao XM.(2018).A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films.Materials Letters,216(0),179-181.
MLA Xu SS,et al."A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films".Materials Letters 216.0(2018):179-181.
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