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Role of complexing ligands in trivalent chromium electrodeposition
Department固体润滑国家重点实验室
Ceng ZX(曾志翔); Zhang YX(张英欣); Zhao WJ(赵文杰); Zhang JY(张俊彦); 张俊彦 zhangjunyan@licp.cas.cn
2011
Source PublicationSurface and Coatings Technology
ISSN0257-8972
Volume205Pages:4771-4775
AbstractIn this study, the Cr(III)-formate, Cr(III)-oxalate and Cr(III)-glycine electrolytes are used as sources for electrodepositing the Cr coatings. The deposition rate and brightness range of the electroplating process in these electrolytes are investigated. The geometric structures of the Cr complex ions are optimized, using density functional theory with General Gradient Approximation/Perdew-Wang 91 (GGA/PW91) calculation. It is found that the deposition rate and brightness range significantly depend on the geometric structure of the Cr(III)-ligand complex ions. The expansion of the distance between Cr and H2O induced by the introduced complexing ligand is a necessary condition for the electrochemical reduction of Cr(III) to metal Cr. The dehydration rate of Cr(III)-ligand complex ions determines the electroplating characteristics of electrolytes.
KeywordTrivalent Chromium Complexing Ligand Electroreduction Geometric Structure
Subject Area材料科学与物理化学
Funding Organizationthe “Outstanding Talent Recruiting Program Dedicated to Academician Q. J. Xue” (2009A31004) from Ningbo municipal government and the “Zhejiang Natural Sciences Foundation”
Indexed BySCI
Language英语
Funding Project纳米润滑研究组
Citation statistics
Cited Times:48[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/2226
Collection固体润滑国家重点实验室(LSL)
Corresponding Author张俊彦 zhangjunyan@licp.cas.cn
Recommended Citation
GB/T 7714
Ceng ZX,Zhang YX,Zhao WJ,et al. Role of complexing ligands in trivalent chromium electrodeposition[J]. Surface and Coatings Technology,2011,205:4771-4775.
APA 曾志翔,张英欣,赵文杰,张俊彦,&张俊彦 zhangjunyan@licp.cas.cn.(2011).Role of complexing ligands in trivalent chromium electrodeposition.Surface and Coatings Technology,205,4771-4775.
MLA 曾志翔,et al."Role of complexing ligands in trivalent chromium electrodeposition".Surface and Coatings Technology 205(2011):4771-4775.
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