Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering | |
Department | 固体润滑国家重点实验室 |
Zhang, X. X.1,3; Wu, Y. Z.1; Mu, B.2; Qiao L(乔丽)3; Li, W. X.4; Li, J. J.4; Wang P(王鹏)3; Wang P(王鹏) | |
2017 | |
Source Publication | Journal of Nuclear Materials |
ISSN | 0022-3115 |
Volume | 485Pages:1-7 |
Abstract | Tungsten sub-nitride thin films deposited on silicon samples by reactive magnetron sputtering were used as a model system to study the phase stability and microstructural evolution during thermal treatments. XRD, SEM&FIB, XPS, RBS and TDS were applied to investigate the stability of tungsten nitride films after heating up to 1473 K in vacuum. At the given experimental parameters a 920 nm thick crystalline film with a tungsten and nitrogen stoichiometry of 2:1 were achieved. The results showed that no phase and microstructure change occurred due to W2N film annealing in vacuum up to 973 K. Heating up to 1073 K led to a partial decomposition of the W2N phase and the formation of a W enrichment layer at the surface. Increasing the annealing time at the same temperature, the further decomposition of the W2N phase was negligible. The complete decomposition of W2N film happened as the temperature reached up to 1473 K. |
Keyword | Magnetron Sputtering Tungsten Sub-nitride Thermal Stability Structure Annealing Thermal Desorption Spectroscopy |
Subject Area | 材料科学与物理化学 |
DOI | 10.1016/j.jnucmat.2016.12.009 |
Funding Organization | the National Natural Science Foundation of China (Grant No: 11475236) |
Indexed By | SCI |
If | 2.048 |
Language | 英语 |
Funding Project | 辐照环境下润滑与防护材料组 |
compositor | 第三作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/21515 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Wu, Y. Z.; Wang P(王鹏) |
Affiliation | 1.Lanzhou Univ Technol, Sch Mat Sci & Engn, Lanzhou 730050, Peoples R China 2.Lanzhou Univ Technol, Coll Petrochem Technol, Lanzhou 730050, Peoples R China 3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730050, Peoples R China 4.Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100190, Peoples R China |
Recommended Citation GB/T 7714 | Zhang, X. X.,Wu, Y. Z.,Mu, B.,et al. Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering[J]. Journal of Nuclear Materials,2017,485:1-7. |
APA | Zhang, X. X..,Wu, Y. Z..,Mu, B..,Qiao L.,Li, W. X..,...&王鹏.(2017).Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering.Journal of Nuclear Materials,485,1-7. |
MLA | Zhang, X. X.,et al."Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering".Journal of Nuclear Materials 485(2017):1-7. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
1-s2.0-S002231151630(2095KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment