Constructing Solid-Gas-Interfacial Fenton Reaction over Alkalinized-C3N4 Photocatalyst To Achieve Apparent Quantum Yield of 49% at 420 nm
DepartmentERC国家工程研究中心
Li, Yunxiang1,2; Ouyang, Shuxin1,2,3; Xu, Hua1,2,3; Wang, Xin1,2; Bi YP(毕迎普)4; Zhang, Yuanfang1,2; Ye JH(叶金花)1,2,3,5; Ye JH(叶金花)
The second departmentosso国家重点实验室
2016
Source PublicationJournal of the American Chemical Society
ISSN0002-7863
Volume138Issue:40Pages:13289-13297
Abstract

Efficient generation of active oxygen-related radicals plays an essential role in boosting advanced oxidation process. To promote photocatalytic oxidation for gaseous pollutant over g-C3N4, a solid–gas interfacial Fenton reaction is coupled into alkalinized g-C3N4-based photocatalyst to effectively convert photocatalytic generation of H2O2 into oxygen-related radicals. This system includes light energy as power, alkalinized g-C3N4-based photocatalyst as an in situ and robust H2O2 generator, and surface-decorated Fe3+ as a trigger of H2O2 conversion, which attains highly efficient and universal activity for photodegradation of volatile organic compounds (VOCs). Taking the photooxidation of isopropanol as model reaction, this system achieves a photoactivity of 2–3 orders of magnitude higher than that of pristine g-C3N4, which corresponds to a high apparent quantum yield of 49% at around 420 nm. In-situ electron spin resonance (ESR) spectroscopy and sacrificial-reagent incorporated photocatalytic characterizations indicate that the notable photoactivity promotion could be ascribed to the collaboration between photocarriers (electrons and holes) and Fenton process to produce abundant and reactive oxygen-related radicals. The strategy of coupling solid–gas interfacial Fenton process into semiconductor-based photocatalysis provides a facile and promising solution to the remediation of air pollution via solar energy.

Subject Area物理化学与绿色催化
DOI10.1021/jacs.6b07272
Funding Organizationthe National Basic Research Program of China (973 Program, No. 2014CB239301);National Natural Science Foundation of China (21573158;51502200;51502198);Natural Science Foundation of Tianjin (15JCYBJC17400;15JCQNJC03500);the "Peiyang Young Researcher" Program of Tianjin University (No. 2015XRX-0019)
Indexed BySCI
If13.858
Language英语
Funding Project能源与环境纳米催化材料组
compositor第四作者单位
Citation statistics
Cited Times:346[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/20972
Collection精细石油化工中间体国家工程研究中心(ERC)
羰基合成与选择氧化国家重点实验室(OSSO)
Corresponding AuthorYe JH(叶金花)
Affiliation1.TU-NIMS Joint Research Center, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, PR China
2.Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, PR China
3.Key Lab of Advanced Ceramics and Machining Technology, Ministry of Education, Tianjin 300072, PR China
4.State Key Laboratory for Oxo Synthesis & Selective Oxidation and National Engineering Research Center for Fine Petrochemical Intermediates, Lanzhou Institute of Chemical Physics, CAS, Lanzhou 730000, PR China
5.International Center for Materials Nanoarchitectonics (WPI-MANA) and Environmental Remediation Materials Unit, National Institute for Materials Science (NIMS), Tsukuba 305-0047, Japan
Recommended Citation
GB/T 7714
Li, Yunxiang,Ouyang, Shuxin,Xu, Hua,et al. Constructing Solid-Gas-Interfacial Fenton Reaction over Alkalinized-C3N4 Photocatalyst To Achieve Apparent Quantum Yield of 49% at 420 nm[J]. Journal of the American Chemical Society,2016,138(40):13289-13297.
APA Li, Yunxiang.,Ouyang, Shuxin.,Xu, Hua.,Wang, Xin.,Bi YP.,...&叶金花.(2016).Constructing Solid-Gas-Interfacial Fenton Reaction over Alkalinized-C3N4 Photocatalyst To Achieve Apparent Quantum Yield of 49% at 420 nm.Journal of the American Chemical Society,138(40),13289-13297.
MLA Li, Yunxiang,et al."Constructing Solid-Gas-Interfacial Fenton Reaction over Alkalinized-C3N4 Photocatalyst To Achieve Apparent Quantum Yield of 49% at 420 nm".Journal of the American Chemical Society 138.40(2016):13289-13297.
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