LICP OpenIR  > 固体润滑国家重点实验室(LSL)
Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature
Department固体润滑国家重点实验室
Zhang B(张斌); Yu YL(于元烈); Zhang JY(张俊彦)
2009
Source PublicationJournal of Physics D: Applied Physics
ISSN0022-3727
Volume42Pages:185304(1-6)
AbstractNitrogen-doped carbon films were fabricated on nickel-coated and uncoated silicon substrates by magnetron sputtering of pyrolytic carbon. The analytical results confirm that the films grown only on nickel-coated silicon are nanocolumns with a graphite-like sheet structure. Nickel acted as a catalyst and lowered the nuclei energy in the growth of nanocolumns by surface and step-edge processes at a temperature of 160 ◦ C. Field emission test shows that the nitrogen-doped carbon nanocolumn films have a low turn-on field of 2.4Vcm−1 owing to the unique structure with 49.1% sp2 bonds and high slenderness ratio of CNx nanocolumns.
Subject Area材料科学与物理化学
Funding Organizationthe ‘863’ programme (Grant No 2007AA032338) of the Chinese Ministry of Science;the National Natural Science Foundation of China (Grant No 50823008)
Indexed BySCI
Language英语
Funding Project纳米润滑研究组
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/2085
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorZhang JY(张俊彦)
Recommended Citation
GB/T 7714
Zhang B,Yu YL,Zhang JY. Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature[J]. Journal of Physics D: Applied Physics,2009,42:185304(1-6).
APA 张斌,于元烈,&张俊彦.(2009).Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature.Journal of Physics D: Applied Physics,42,185304(1-6).
MLA 张斌,et al."Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature".Journal of Physics D: Applied Physics 42(2009):185304(1-6).
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