Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature | |
Department | 固体润滑国家重点实验室 |
Zhang B(张斌); Yu YL(于元烈); Zhang JY(张俊彦) | |
2009 | |
Source Publication | Journal of Physics D: Applied Physics |
ISSN | 0022-3727 |
Volume | 42Pages:185304(1-6) |
Abstract | Nitrogen-doped carbon films were fabricated on nickel-coated and uncoated silicon substrates by magnetron sputtering of pyrolytic carbon. The analytical results confirm that the films grown only on nickel-coated silicon are nanocolumns with a graphite-like sheet structure. Nickel acted as a catalyst and lowered the nuclei energy in the growth of nanocolumns by surface and step-edge processes at a temperature of 160 ◦ C. Field emission test shows that the nitrogen-doped carbon nanocolumn films have a low turn-on field of 2.4Vcm−1 owing to the unique structure with 49.1% sp2 bonds and high slenderness ratio of CNx nanocolumns. |
Subject Area | 材料科学与物理化学 |
Funding Organization | the ‘863’ programme (Grant No 2007AA032338) of the Chinese Ministry of Science;the National Natural Science Foundation of China (Grant No 50823008) |
Indexed By | SCI |
Language | 英语 |
Funding Project | 纳米润滑研究组 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/2085 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Zhang JY(张俊彦) |
Recommended Citation GB/T 7714 | Zhang B,Yu YL,Zhang JY. Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature[J]. Journal of Physics D: Applied Physics,2009,42:185304(1-6). |
APA | 张斌,于元烈,&张俊彦.(2009).Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature.Journal of Physics D: Applied Physics,42,185304(1-6). |
MLA | 张斌,et al."Magnetron sputtering deposition of carbon nitride nanocolumns at low temperature".Journal of Physics D: Applied Physics 42(2009):185304(1-6). |
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