LICP OpenIR  > 固体润滑国家重点实验室(LSL)
Fabrication of highly conductive Ru/a-CNx:H composite films by anode deposit
Department固体润滑国家重点实验室
Yu YL(于元烈); Zhang B(张斌); Zhang JY(张俊彦)
2009
Source PublicationElectrochemistry Communications
ISSN1388-2481
Volume11Pages:772-775
AbstractRuthenium(0) composite hydrogenated amorphous carbon nitride (Ru/a-CNx:H) films were deposition on single crystal silicon (100) substrate by electrochemical deposition technique with acetonitrile as carbon source, and Ru3(CO)12 as dopant. In the deposited progress, the Si (100) acted as anode. The relative atomic ratio of Ru/N/C was about 0.28/0.33/1, and Ru nanocrystalline particles about 8 nm were homo- geneously dispersed into the amorphous carbon matrix. After doping Ru into a-CNx:H films, the conduc- tivity of the films were evidently improved and the resistivity drastically decrease from 108 Ω cm to about 100 Ω cm.
KeywordRu/a-cnx:h Composite FIlms Anode Deposit Conductivity
Subject Area材料科学与物理化学
Funding Organizationthe National Natural Science Foundation of China (Grant No. 50572108;50721062);the “Hundreds Talent Program” of Chinese Academy of Sciences
Indexed BySCI
Language英语
Funding Project纳米润滑研究组
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/2040
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorZhang JY(张俊彦)
Recommended Citation
GB/T 7714
Yu YL,Zhang B,Zhang JY. Fabrication of highly conductive Ru/a-CNx:H composite films by anode deposit[J]. Electrochemistry Communications,2009,11:772-775.
APA 于元烈,张斌,&张俊彦.(2009).Fabrication of highly conductive Ru/a-CNx:H composite films by anode deposit.Electrochemistry Communications,11,772-775.
MLA 于元烈,et al."Fabrication of highly conductive Ru/a-CNx:H composite films by anode deposit".Electrochemistry Communications 11(2009):772-775.
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