Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals
Department先进润滑与防护材料研究发展中心
Quan, W. L.1; Sun, X. W.1; Song, Q.1; Fu, Z. J.2; Guo, P.1; Tian, J. H.1; Chen JM(陈建敏)3
The second department固体润滑国家重点实验室
2012
Source PublicationApplied Surface Science
ISSN0169-4332
Volume263Pages:339-344
AbstractThe growth of hydrogenated carbon film from CH radicals is studied by classical molecular dynamics simulation for various incident energies (3.25–130 eV). The impingement of CH radical and its effect on the microstructure of formed film are carefully analyzed. It is found that the sp3-C fraction is almost identical to the H concentration for all films; both of them decrease with increasing incident energy. To deposit hydrogenated carbon film with fine smoothness, the energy of incident CH should be 10–70 eV. At other energies (either lower or higher), deposited films are of roughness and with some chain-like structures at surface. Different growth mechanisms behind these observations are discussed.
KeywordHydrogenated Carbon Film Ch Radical Molecular Dynamics Simulation Growth Mechanism
Subject Area材料科学与物理化学
DOI10.1016/j.apsusc.2012.09.057
Funding Organizationthe National Natural Science Foundation of China (Grant No. 10674120);the Young Scholars Science Foundation of Lanzhou Jiaotong University (Grant No. 2011027)
Indexed BySCI
If2.112
Language英语
compositor第三作者单位
Citation statistics
Cited Times:7[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/19442
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
固体润滑国家重点实验室(LSL)
Corresponding AuthorQuan, W. L.
Affiliation1.Lanzhou Jiaotong Univ, Sch Math Phys & Software Engn, Lanzhou 730070, Peoples R China
2.Chongqing Univ Arts & Sci, Sch Elect & Elect Engn, Chongqing 402160, Peoples R China
3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
Recommended Citation
GB/T 7714
Quan, W. L.,Sun, X. W.,Song, Q.,et al. Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals[J]. Applied Surface Science,2012,263:339-344.
APA Quan, W. L..,Sun, X. W..,Song, Q..,Fu, Z. J..,Guo, P..,...&Chen JM.(2012).Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals.Applied Surface Science,263,339-344.
MLA Quan, W. L.,et al."Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals".Applied Surface Science 263(2012):339-344.
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