Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals | |
Department | 先进润滑与防护材料研究发展中心 |
Quan, W. L.1; Sun, X. W.1; Song, Q.1; Fu, Z. J.2; Guo, P.1; Tian, J. H.1; Chen JM(陈建敏)3 | |
The second department | 固体润滑国家重点实验室 |
2012 | |
Source Publication | Applied Surface Science |
ISSN | 0169-4332 |
Volume | 263Pages:339-344 |
Abstract | The growth of hydrogenated carbon film from CH radicals is studied by classical molecular dynamics simulation for various incident energies (3.25–130 eV). The impingement of CH radical and its effect on the microstructure of formed film are carefully analyzed. It is found that the sp3-C fraction is almost identical to the H concentration for all films; both of them decrease with increasing incident energy. To deposit hydrogenated carbon film with fine smoothness, the energy of incident CH should be 10–70 eV. At other energies (either lower or higher), deposited films are of roughness and with some chain-like structures at surface. Different growth mechanisms behind these observations are discussed. |
Keyword | Hydrogenated Carbon Film Ch Radical Molecular Dynamics Simulation Growth Mechanism |
Subject Area | 材料科学与物理化学 |
DOI | 10.1016/j.apsusc.2012.09.057 |
Funding Organization | the National Natural Science Foundation of China (Grant No. 10674120);the Young Scholars Science Foundation of Lanzhou Jiaotong University (Grant No. 2011027) |
Indexed By | SCI |
If | 2.112 |
Language | 英语 |
compositor | 第三作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/19442 |
Collection | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 固体润滑国家重点实验室(LSL) |
Corresponding Author | Quan, W. L. |
Affiliation | 1.Lanzhou Jiaotong Univ, Sch Math Phys & Software Engn, Lanzhou 730070, Peoples R China 2.Chongqing Univ Arts & Sci, Sch Elect & Elect Engn, Chongqing 402160, Peoples R China 3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
Recommended Citation GB/T 7714 | Quan, W. L.,Sun, X. W.,Song, Q.,et al. Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals[J]. Applied Surface Science,2012,263:339-344. |
APA | Quan, W. L..,Sun, X. W..,Song, Q..,Fu, Z. J..,Guo, P..,...&Chen JM.(2012).Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals.Applied Surface Science,263,339-344. |
MLA | Quan, W. L.,et al."Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals".Applied Surface Science 263(2012):339-344. |
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1-s2.0-S016943321201(2468KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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