Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse
Department先进润滑与防护材料研究发展中心
Wang J(汪佳)1,2; Cao ZY(曹忠跃)1,2; Pan FP(潘富平)1,2; Wang FG(王富国)1; Liang AM(梁爱民)1; Zhang JY(张俊彦)1; Wang FG(王富国); Zhang JY(张俊彦)
The second department固体润滑国家重点实验室
2015
Source PublicationApplied Surface Science
ISSN0169-4332
Volume356Pages:695-700
AbstractAmorphous hydrogenated carbon (a-C:H) films were prepared by high frequency unipolar pulse plasma-enhanced chemical vapor deposition in CH4, Ar, and H-2 atmosphere with the bias voltage in the range of -800 - -1600 V. The microstructures and mechanical properties of a-C:H films were investigated via high resolution transmission electron microscope (HRTEM), Raman spectroscopy, and Nanoindenter. The results reveal that the curved and straight graphitic microstructures appear in amorphous carbon matrix, and their contents increase obviously with the bias voltage. At the same time, the corresponding hardness decreases and elastic recovery increases, however even in such a case films still possess excellent mechanical properties. According to the tribological property characterization, we believe that the bias voltage also influences their tribological performances significantly, the higher the bias voltage finally gets, the lower the friction coefficient and wear rate occur. These results indicate that the microstructures of a-C:H films can be tuned efficiently by bias voltage and the films with good mechanical and tribological properties can be obtained at a higher range.
KeywordA-c:h Film Bias Voltage Microstructure Mechanical Properties Tribological Properties
Subject Area材料科学与物理化学
DOI10.1016/j.apsusc.2015.08.091
Funding Organizationthe Major State Basic Research Development Program of China (973 Program) (No. 2013CB632304)
Indexed BySCI
If3.150
Language英语
Funding Project纳米润滑研究组
compositor第一作者单位
Citation statistics
Cited Times:11[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/19116
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
固体润滑国家重点实验室(LSL)
Corresponding AuthorWang FG(王富国); Zhang JY(张俊彦)
Affiliation1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
Recommended Citation
GB/T 7714
Wang J,Cao ZY,Pan FP,et al. Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse[J]. Applied Surface Science,2015,356:695-700.
APA Wang J.,Cao ZY.,Pan FP.,Wang FG.,Liang AM.,...&张俊彦.(2015).Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse.Applied Surface Science,356,695-700.
MLA Wang J,et al."Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse".Applied Surface Science 356(2015):695-700.
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