磁控溅射沉积BCx薄膜的摩擦学性能

	磁控溅射沉积BCx薄膜的摩擦学性能
Department	固体润滑国家重点实验室
	尚伦霖; 王立平; 张广安; 蒲吉斌
	2015
Source Publication	中国表面工程
ISSN	1007-9289
Volume	28 Issue:5 Pages:16-23
Keyword	Bcx薄膜磁控溅射靶电流摩擦学性能 Bcx Films Magnetron Sputtering Target Current Tribological Properties
Subject Area	低维材料摩擦学
DOI	10.11933/j.issn.1007-9289.2015.05.003
Funding Organization	国家自然科学基金(51322508;51305433)
Indexed By	CSCD
If	0.4366
Language	中文
Funding Project	低维材料摩擦学组
compositor	第一作者单位
Citation statistics
Document Type	期刊论文
Identifier	http://ir.licp.cn/handle/362003/18704
Collection	固体润滑国家重点实验室（LSL）
Corresponding Author	张广安
Affiliation	Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences
Recommended Citation GB/T 7714	尚伦霖,王立平,张广安,等. 磁控溅射沉积BCx薄膜的摩擦学性能[J]. 中国表面工程,2015,28(5):16-23.
APA	尚伦霖,王立平,张广安,&蒲吉斌.(2015).磁控溅射沉积BCx薄膜的摩擦学性能.中国表面工程,28(5),16-23.
MLA	尚伦霖,et al."磁控溅射沉积BCx薄膜的摩擦学性能".中国表面工程 28.5(2015):16-23.

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