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Microstructures and properties of titanium nitride films prepared by pulsed laser deposition at different substrate temperatures
Department固体润滑国家重点实验室
Guo HJ(国洪建)1,2,3; Chen WY(陈文远)1,2; Shan Y(陕钰)1; Wang WZ(王文珍)1; Zhang, Zhenyu3; Jia JH(贾均红)1; Jia JH(贾均红)
2015
Source PublicationApplied Surface Science
ISSN0169-4332
Volume357Pages:473-478
AbstractThe nanostructured titanium nitride (TiN) films were fabricated by pulsed laser deposition (PLD) technique at different substrate temperatures under residual vacuum, and the influence of substrate temperatures on the microstructure, mechanical and tribological properties of TiN films was investigated and discussed. The results shown that the consistent stoichiometric TiN films were obtained and the grain size increased from 10.5 to 38.7 nm with the increasing of substrate temperature. The hardness of films decreased with the substrate temperatures increasing, the highest hardness reached to 30.6 GPa at the substrate temperature of 25 , and the critical load increased first and decreased at 500 , the highest critical load was 23.8 N at the substrate temperature of 300 . The film deposited at the substrate temperature of 25 registered the lowest friction coefficient of 0.088 and wear rate of 7.8 x 10-7 mm3/(N m). The excellent tribological performance of the films was attributed to the small grain size, high hardness and smooth surface of the film.
KeywordTitanium Nitride Film Pulsed Laser Deposition (Pld) Substrate Temperature Microstructure Tribology Property
Subject Area材料科学与物理化学
DOI10.1016/j.apsusc.2015.09.061
Funding OrganizationNational Natural Science Foundation of China (Grant No. 51175490);National Defense Science and Technology Innovation Foundation of Chinese Academy of Sciences (Grant No. CXJJ-14-M39);the Project of Gansu Province Longyuan Young Creative Talents (Grant No. 2015GS06462)
Indexed BySCI
If2.711
Language英语
Funding Project高温抗磨材料组
compositor第一作者单位
Citation statistics
Cited Times:50[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/18687
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorJia JH(贾均红)
Affiliation1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
3.Lanzhou Inst Technol, Lanzhou 730000, Peoples R China
Recommended Citation
GB/T 7714
Guo HJ,Chen WY,Shan Y,et al. Microstructures and properties of titanium nitride films prepared by pulsed laser deposition at different substrate temperatures[J]. Applied Surface Science,2015,357:473-478.
APA Guo HJ.,Chen WY.,Shan Y.,Wang WZ.,Zhang, Zhenyu.,...&贾均红.(2015).Microstructures and properties of titanium nitride films prepared by pulsed laser deposition at different substrate temperatures.Applied Surface Science,357,473-478.
MLA Guo HJ,et al."Microstructures and properties of titanium nitride films prepared by pulsed laser deposition at different substrate temperatures".Applied Surface Science 357(2015):473-478.
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