A fair use statement regarding the full text of the request

Your requested [Toughness measurement and toughening mechanisms of arc ion plating Cr2O3 films treated by annealing] is currently limited to Lanzhou Institute of Chemical Physics，Chinese Academy of Sciences internal sharing.

To solicit author authorization, you need to provide the following information: name, organization, personal e-mail, reason for request. The information you provide will be reviewed and you are committed to the truth of the information provided. The personal information you provide will be protected according to law.