LICP OpenIR

A fair use statement regarding the full text of the request

Your requested [基体偏压对反应磁控溅射ZrN/α-SiNx纳米多层薄膜结构及性能的影响] is currently limited to Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences internal sharing.


To solicit author authorization, you need to provide the following information: name, organization, personal e-mail, reason for request. The information you provide will be reviewed and you are committed to the truth of the information provided. The personal information you provide will be protected according to law.

基体偏压对反应磁控溅射ZrN/α-SiNx纳米多层薄膜结构及性能的影响
Refresh

You agree and are willing to abide by the above requirements.