LICP OpenIR

A fair use statement regarding the full text of the request

Your requested [The Effects of Precursor C2H2 Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition] is currently limited to Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences internal sharing.


To solicit author authorization, you need to provide the following information: name, organization, personal e-mail, reason for request. The information you provide will be reviewed and you are committed to the truth of the information provided. The personal information you provide will be protected according to law.

The Effects of Precursor C2H2 Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition
Refresh

You agree and are willing to abide by the above requirements.